Review—Laser Ablation Ionization Mass Spectrometry (LIMS) for Analysis of Electrodeposited Cu Interconnects

Riedo, Valentine; Moreno-García, Pavel; Riedo, Andreas; López, Alena Cedeño; Tulej, Marek; Wiesendanger, Reto; Wurz, Peter; Broekmann, Peter (2019). Review—Laser Ablation Ionization Mass Spectrometry (LIMS) for Analysis of Electrodeposited Cu Interconnects. Journal of the electrochemical society, 166(1), D3190-D3199. The Electrochemical Society 10.1149/2.0221901jes

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In this contribution highly sensitive and quantitative analytical methodologies based on femtosecond Laser Ablation Ionization Mass Spectrometry (fs-LIMS) for the analysis of model systems and state-of-the-art Cu interconnects are reviewed and discussed. The method development introduces in a first stage a 1D chemical depth profiling approach on electrodeposited Cu films containing periodically confined organic layers. Optimization of measurement conditions on these test platforms enabled depth profiling investigations with vertical resolution at the nm level. In a second stage, a matrix-free laser desorption methodology was developed that allowed for preliminary molecular identification of the embedded organic contaminants beyond elementary composition. These studies provided specific fragmentation markers in the lower mass range, which support a previously proposed reaction mechanism responsible for successful leveling employing a new class of plating additives for Damascene processes. Further combined LIMS and Scanning Auger Microscopy (SAM) studies on through-silicon-vias (TSV) interconnects confirmed the embedment upon plating of the organic additives at the upper side-walls of the TSV channel in the boundary between the Cu seed layer and the electrodeposited Cu.

Item Type:

Journal Article (Original Article)

Division/Institute:

08 Faculty of Science > Physics Institute

UniBE Contributor:

Riedo, Valentine; Riedo, Andreas; Tulej, Marek; Wiesendanger, Reto and Wurz, Peter

Subjects:

500 Science > 520 Astronomy
600 Technology > 620 Engineering
500 Science > 530 Physics

ISSN:

0013-4651

Publisher:

The Electrochemical Society

Language:

English

Submitter:

Dora Ursula Zimmerer

Date Deposited:

29 Jan 2019 14:49

Last Modified:

29 Jan 2019 14:49

Publisher DOI:

10.1149/2.0221901jes

BORIS DOI:

10.7892/boris.122701

URI:

https://boris.unibe.ch/id/eprint/122701

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