Topological Defect-Induced Magnetism in a Nanographene

Mishra, Shantanu; Beyer, Doreen; Berger, Reinhard; Liu, Junzhi; Gröning, Oliver; Urgel, José I.; Müllen, Klaus; Ruffieux, Pascal; Feng, Xinliang; Fasel, Roman (2020). Topological Defect-Induced Magnetism in a Nanographene. Journal of the American Chemical Society, 142(3), pp. 1147-1152. American Chemical Society 10.1021/jacs.9b09212

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Item Type:

Journal Article (Original Article)

Division/Institute:

08 Faculty of Science > Departement of Chemistry and Biochemistry

UniBE Contributor:

Fasel, Roman

Subjects:

500 Science > 570 Life sciences; biology
500 Science > 540 Chemistry
500 Science > 530 Physics

ISSN:

0002-7863

Publisher:

American Chemical Society

Language:

English

Submitter:

Roman Fasel

Date Deposited:

06 Apr 2020 09:44

Last Modified:

06 Apr 2020 09:44

Publisher DOI:

10.1021/jacs.9b09212

PubMed ID:

31904953

BORIS DOI:

10.7892/boris.141665

URI:

https://boris.unibe.ch/id/eprint/141665

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