Oxygen vacancy diffusion in alumina: New atomistic simulation methods applied to an old problem

Aschauer, Ulrich Johannes; Bowen, P.; Parker, S.C. (2009). Oxygen vacancy diffusion in alumina: New atomistic simulation methods applied to an old problem. Acta Materialia, 57(16), pp. 4765-4772. Elsevier Science 10.1016/j.actamat.2009.06.061

Full text not available from this repository. (Request a copy)

Item Type:

Journal Article (Original Article)

Division/Institute:

08 Faculty of Science > Departement of Chemistry and Biochemistry

UniBE Contributor:

Aschauer, Ulrich Johannes

Subjects:

500 Science > 570 Life sciences; biology
500 Science > 540 Chemistry
600 Technology > 620 Engineering

ISSN:

1359-6454

Publisher:

Elsevier Science

Language:

English

Submitter:

Ulrich Johannes Aschauer

Date Deposited:

13 Jan 2016 08:40

Last Modified:

13 Jan 2016 08:40

Publisher DOI:

10.1016/j.actamat.2009.06.061

URI:

https://boris.unibe.ch/id/eprint/72966

Actions (login required)

Edit item Edit item
Provide Feedback