Parylene-AlOx Stacks for Improved 3D Encapsulation Solutions

Buchwalder, Sébastien; Bourgeois, Florian; Leon, Juan J. Diaz; Hogg, Andreas; Burger, Jürgen (2023). Parylene-AlOx Stacks for Improved 3D Encapsulation Solutions. Coatings, 13(11), p. 1942. MDPI 10.3390/coatings13111942

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The demand for ultra-tight encapsulation solutions with excellent barrier and high conformality properties has increased in recent years. To meet these challenges, thin-film barrier coatings have emerged as a promising solution. In this study, we investigate well-established silicon-based plasma-enhanced chemical vapor deposition (PECVD) and metal oxide atomic layer deposition (ALD) barrier coatings deposited at low temperatures (≤100 °C) regarding their abilities to address high-level 3D encapsulation applications. Various combinations of such layers are evaluated by measuring the water vapor transmission rate (WVTR) and considering the conformality properties. The impact and the benefits of the organic film integration, namely parylene VT4 grade, on the barrier performances is assessed. Among these combinations, parylene-AlOx stack emerges as one of the most effective solutions, obtaining a WVTR of 3.1 × 10^−4 g m^−2 day^−1 at 38°C and 90% relative humidity conditions.

Item Type:

Journal Article (Original Article)

Division/Institute:

08 Faculty of Science > School of Biomedical and Precision Engineering (SBPE)
08 Faculty of Science > School of Biomedical and Precision Engineering (SBPE) > Smart Surgical Instruments and Medical Devices

Graduate School:

Graduate School for Cellular and Biomedical Sciences (GCB)

UniBE Contributor:

Buchwalder, Sébastien, Burger, Jürgen

Subjects:

600 Technology > 610 Medicine & health
600 Technology > 620 Engineering

ISSN:

2079-6412

Publisher:

MDPI

Funders:

[198] Innosuisse - Swiss Innovation Agency

Language:

English

Submitter:

Nicolas Gerber

Date Deposited:

21 Nov 2023 06:52

Last Modified:

21 Nov 2023 06:52

Publisher DOI:

10.3390/coatings13111942

BORIS DOI:

10.48350/189210

URI:

https://boris.unibe.ch/id/eprint/189210

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