Combined Secondary Ion Mass Spectrometry Depth Profiling and Focused Ion Beam Analysis of Cu Films Electrodeposited under Oscillatory Conditions

Nguyen, Thi Minh Hai; Lechner, David; Stricker, Florian Ulrich; Furrer, Julien; Broekmann, Peter (2015). Combined Secondary Ion Mass Spectrometry Depth Profiling and Focused Ion Beam Analysis of Cu Films Electrodeposited under Oscillatory Conditions. ChemElectroChem, 2(5), pp. 664-671. Wiley 10.1002/celc.201402427

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The recrystallization behavior of Cu films electrodeposited under oscillatory conditions in the presence of plating additives was studied by means of secondary ion mass spectrometry (SIMS) and focused ion beam analysis. When combined with bis-(sodium-sulfopropyl)-disulfide (SPS), Imep levelers (polymerizates of imidazole and epichlorohydrin) show characteristic oscillations in the galvanostatic potential/time transient measurements. These are related to the periodic degradation and restoration of the active leveler ensemble at the interface. The leveler action relies on adduct formation between the Imep and MPS (mercaptopropane sulfonic acid)-stabilized CuI complexes that appear as intermediates of the copper deposition when SPS is present in the electrolyte. SIMS depth profiling proves that additives are incorporated into the growing film preferentially under transient conditions during the structural breakdown of the leveler ensemble and its subsequent restoration. In contrast, Cu films electrodeposited in the presence of a structurally intact Imep–CuI–MPS ensemble remain largely contamination free.

Item Type:

Journal Article (Original Article)

Division/Institute:

08 Faculty of Science > Departement of Chemistry and Biochemistry

UniBE Contributor:

Nguyen, Thi Minh Hai; Lechner, David; Stricker, Florian Ulrich; Furrer, Julien and Broekmann, Peter

Subjects:

500 Science > 570 Life sciences; biology
500 Science > 540 Chemistry

ISSN:

2196-0216

Publisher:

Wiley

Language:

English

Submitter:

Julien Henri Lucien Furrer

Date Deposited:

11 Mar 2015 17:03

Last Modified:

15 Jan 2016 07:52

Publisher DOI:

10.1002/celc.201402427

BORIS DOI:

10.7892/boris.64313

URI:

https://boris.unibe.ch/id/eprint/64313

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