Whitlow, Harry J.; Norarat, Rattanaporn; Roccio, Marta; Jeanneret, Patrick; Guibert, Edouard; Bergamin, Maxime; Fiorucci, Gianni; Homsy, Alexandra; Laux, Edith; Keppner, Herbert; Senn, Pascal (2015). MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 354, pp. 34-36. Elsevier 10.1016/j.nimb.2014.10.024
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Parylenes are poly(p-xylylene) polymers that are widely used as moisture barriers and in biomedicine because of their good biocompatibility. We have investigated MeV ion beam lithography using 16O+ ions for writing defined patterns in Parylene-C, which is evaluated as a coating material for the Cochlear Implant (CI) electrode array, a neuroprosthesis to treat some forms of deafness. Parylene-C and -F on silicon and glass substrates as well as 50 μm thick PTFE were irradiated to different fluences (1×1013-1×10161×1013-1×1016 1 MeV 16O+ ions cm−2) through aperture masks under high vacuum and a low pressure (<10−3 mbar) oxygen atmosphere. Biocompatibility of the irradiated and unirradiated surfaces was tested by cell-counting to determine the proliferation of murine spiral ganglion cells. The results reveal that an oxygen ion beam can be used to pattern Parylene-C and -F without using a liquid solvent developer in a similar manner to PTFE but with a ∼25× smaller removal rate. Biocompatibility tests showed no difference in cell adhesion between irradiated and unirradiated areas or ion fluence dependence. Coating the Parylene surface with an adhesion-promoting protein mixture had a much greater effect on cell proliferation.
Item Type: |
Journal Article (Original Article) |
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Division/Institute: |
04 Faculty of Medicine > Department of Head Organs and Neurology (DKNS) > Clinic of Ear, Nose and Throat Disorders (ENT) |
UniBE Contributor: |
Roccio, Marta, Senn, Pascal |
Subjects: |
600 Technology > 610 Medicine & health |
ISSN: |
0168-583X |
Publisher: |
Elsevier |
Language: |
English |
Submitter: |
Markus Huth |
Date Deposited: |
14 Mar 2016 12:44 |
Last Modified: |
05 Dec 2022 14:52 |
Publisher DOI: |
10.1016/j.nimb.2014.10.024 |
BORIS DOI: |
10.7892/boris.76702 |
URI: |
https://boris.unibe.ch/id/eprint/76702 |